Analysis of the low-frequency noise in graded-channel and standard SOI nMOSFET

E. L.R. Da Silva, M. Miguez, M. De Souza, A. Arnaud, M. A. Pavanello

Research output: Chapter in Book/Report/Conference proceedingConference contributionpeer-review

1 Scopus citations

Abstract

In this paper a comparison between the low-frequency noise in graded-channel SOI nMOSFETs (GC SOI MOSFET) and standard fully depleted (FD) SOI nMOSFETs will be presented. The evolution of noise with bias and frequency, mainly in the GC SOI MOSFETs, will be demonstrated. Numerical bidimensional simulations are used to reproduce the same tendencies observed experimentally in order to allow for a physical insight on the noise in GC SOI transistors.

Original languageEnglish
Title of host publicationMicroelectronics Technology and Devices, SBMicro 2010
PublisherElectrochemical Society Inc.
Pages359-366
Number of pages8
Edition1
ISBN (Electronic)9781607681694
ISBN (Print)9781566778190
DOIs
StatePublished - 2010

Publication series

NameECS Transactions
Number1
Volume31
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

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